Conveners
Workshop on Direct Optical Lithography for Advanced Opto- and Microelectronics
- Volodymyr Dzhagan (Lashkaryov Institute of Semiconductor Physics (ISP), NAS of Ukraine)
Workshop on Direct Optical Lithography for Advanced Opto- and Microelectronics
- Volodymyr Dzhagan (Lashkaryov Institute of Semiconductor Physics (ISP), NAS of Ukraine)
Workshop on Direct Optical Lithography for Advanced Opto- and Microelectronics: Closing Remarks
- There are no conveners in this block
Scanning Probe Lithography (SPL) is a versatile technique for prototyping planar nanostructures with simultaneous in situ characterization. Using a nanoscale tip, surfaces can be mechanically or electrically modified to create predefined patterns, either through direct modification or thin resist layer masks. Additionally, interference and plasmon lithography allow for the efficient generation...
Direct laser writing (DLW) has become a leading technology for creating diffractive optical elements (DOE), particularly for submicron structures. As subwavelength optical devices such as photon sieves and metadevices are developed, the need for precise micro- and nanoscale structures grows. Conventional optical systems, limited by the diffraction limit, struggle to form elements smaller than...
