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25TH SYMPOSIUM ON PHOTONICS AND OPTICS SPO 2024

Nov 4 – 8, 2024
Zoom and Faculty of Physics, Taras Shevchenko National University of Kyiv, Kyiv, Ukraine
Europe/Zurich timezone

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Session

Workshop on Direct Optical Lithography for Advanced Opto- and Microelectronics

Nov 6, 2024, 8:15 AM
Room 103 (Zoom and Faculty of Physics, Taras Shevchenko National University of Kyiv, Kyiv, Ukraine)

Room 103

Zoom and Faculty of Physics, Taras Shevchenko National University of Kyiv, Kyiv, Ukraine

The conference will be performed in HYBRID mode: - On-site at Faculty of Physics of Trars Shevchenko National University of Kyiv - VIa ZOOM platform

Conveners

Workshop on Direct Optical Lithography for Advanced Opto- and Microelectronics

  • Volodymyr Dzhagan (Lashkaryov Institute of Semiconductor Physics (ISP), NAS of Ukraine)

Workshop on Direct Optical Lithography for Advanced Opto- and Microelectronics

  • Volodymyr Dzhagan (Lashkaryov Institute of Semiconductor Physics (ISP), NAS of Ukraine)

Workshop on Direct Optical Lithography for Advanced Opto- and Microelectronics: Closing Remarks

  • There are no conveners in this block

Presentation materials

There are no materials yet.

  1. 128. Short Intro about the creation of a maskless lithography lab in Kyiv in the framework of the NRFU project
    Prof. Volodymyr Dzhagan (Lashkaryov Institute of Semiconductor Physics (ISP), NAS of Ukraine)
    11/6/24, 8:15 AM
    Oral
  2. 129. Interference nanolithography based on chalcogenide photoresist
    Dr Viktor Dan’ko (Lashkaryov Institute of Semiconductor Physics (ISP), NAS of Ukraine)
    11/6/24, 8:25 AM
    Invited Talk
  3. 110. Towards control of femtosecond laser structuring of silicon
    Andriy Dmytruk (Institute of Physics NASU)
    11/6/24, 8:45 AM
    Oral

    To be complited soon

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  4. 78. Scanning Probe Lithography and Laser-Assisted Direct Nano-Relief Engineering
    Dr Petro Lytvyn (V. Lashkaryov Institute of Semiconductor Physics NAS Ukraine)
    11/6/24, 9:20 AM
    Invited Talk

    Scanning Probe Lithography (SPL) is a versatile technique for prototyping planar nanostructures with simultaneous in situ characterization. Using a nanoscale tip, surfaces can be mechanically or electrically modified to create predefined patterns, either through direct modification or thin resist layer masks. Additionally, interference and plasmon lithography allow for the efficient generation...

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  5. 32. Direct laser writing in maskless photolithography technology
    Dr Ievgen Beliak (Institute for Information Recording of National Academy of Sciences of Ukraine)
    11/6/24, 9:40 AM
    Oral

    Direct laser writing (DLW) has become a leading technology for creating diffractive optical elements (DOE), particularly for submicron structures. As subwavelength optical devices such as photon sieves and metadevices are developed, the need for precise micro- and nanoscale structures grows. Conventional optical systems, limited by the diffraction limit, struggle to form elements smaller than...

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  6. 130. Laser Beam Lithography at Raith Laser Systems BV
    Dr Kahraman Keskinbora (Raith Laser Systems BV)
    11/6/24, 10:00 AM
    Oral
  7. 133. Advanced Maskless Lithography Techniques for High-Precision Microstructure Fabrication
    Dr Oleksii Kalenyuk (G.V. Kurdyumov Institute for Metal Physics, N.A.S. of Ukraine, Kyiv Academic University)
    11/6/24, 10:20 AM
    Oral
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