Conveners
Workshop on Laser Processing of Materials for Advanced Optoelectronic Applications: Session 1: Ultrafast Ablation and Laser Modification of Materials
- Volodymyr Dzhagan
Workshop on Laser Processing of Materials for Advanced Optoelectronic Applications: Session 2: Laser Synthesis and Direct Laser Writing
- Volodymyr Dzhagan
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Mindaugas Gedvilas (Department of Laser Technologies (LTS), Center for Physical Sciences and Technology (FTMC), Savanoriu Ave. 231, 02300 Vilnius, Lithuania)05/11/2026, 09:05Laser processing of materials for advanced optoelectronic applicationsInvited Talk
Ultrashort pulse laser ablation has become an important technology for precision micro- and nanoprocessing of metals, enabling high spatial resolution, minimal thermal damage, and precise control over surface morphology. However, achieving high processing efficiency while maintaining excellent surface quality remains a major challenge, particularly in industrial applications where high...
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Amit Verma (Department of Electrical Engineering; Adjunct Faculty, MSP, IIT Kanpur)05/11/2026, 09:35Laser processing of materials for advanced optoelectronic applicationsInvited Talk
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Vladyslav Dzhahan (Faculty of Physics of Taras Shevchenko National University of Kyiv)05/11/2026, 10:05Sustainable Materials and Technologies for Optoelectronics and SensorsOral
The development of flexible electronics and biomedical sensors requires new materials that combine electrical conductivity, mechanical flexibility, and ease of fabrication. Among the most promising candidates are graphene and its chemical derivatives – graphene oxide (GO) and reduced graphene oxide (rGO). Graphene exhibits exceptionally high carrier mobility and mechanical strength; however,...
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Danylo Havryliuk (Faculty of Information Security and Electronic Communications, Zaporizhzhia Polytechnic National University)05/11/2026, 10:25Laser processing of materials for advanced optoelectronic applicationsOral
The electrical conductivity and optical properties of graphene oxide are determined by and can be tuned through its degree of reduction, while residual oxygen-containing groups serve as active sites for functionalization and chemical sensing. Reduction is typically achieved via chemical or thermal methods. Laser reduction, by contrast, is a single-step, localized process that requires neither...
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Stanislav Serhiichuk (Lashkaryov Institute of Semiconductor Physics)05/11/2026, 10:40Laser processing of materials for advanced optoelectronic applicationsOral
Controlling laser-matter interaction is a fundamental prerequisite for the maskless patterning of advanced materials, thin films, and functional optoelectronic architectures. Because modern research frequently relies on high-cost specialized lithographic equipment, industrial laser engravers and markers operating across diverse spectral and temporal regimes present a highly accessible and...
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Enrico Di Russo (Department of Physics and Astronomy, University of Padova)05/11/2026, 11:15Laser processing of materials for advanced optoelectronic applicationsInvited Talk
The precise, localized control of semiconductor properties is a central challenge in the development of next-generation nanoelectronics, optoelectronics, and photonic devices. Among the available processing techniques, nanosecond pulsed laser processing has emerged as a uniquely powerful tool, offering spatial and temporal confinement of energy deposition, compatibility with existing Si CMOS...
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Prof. Volodymyr Yukhymchuk (V. Lashkaryov Institute of Semiconductor Physics of National Academy of Sciences of Ukraine)05/11/2026, 11:45Laser processing of materials for advanced optoelectronic applicationsOral
GeSn alloy thin films grown on silicon substrates attract significant attention in infrared optoelectronics. The primary advantage of GeSn is transforming indirect-bandgap germanium into a direct-bandgap semiconductor through substitutional incorporation of 8–10 at.% tin atoms into the Ge lattice. Since the equilibrium solubility of Sn in Ge at room temperature does not exceed 1 at.%,...
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Ievgen Beliak (Institute for Information Recording of National Academy of Sciences of Ukraine)05/11/2026, 12:00Laser processing of materials for advanced optoelectronic applicationsOral
Direct Laser Writing (DLW) enables the fabrication of micro- and submicron structures with predefined geometries directly on the surface of photosensitive and functional materials. At the same time, variations in laser irradiation parameters, non-uniformity of thin-film properties, and instability of individual fabrication stages can result in local defects that affect the geometrical and...
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Oleksii Manko (Institute for Information Recording of the National Academy of Sciences of Ukraine)05/11/2026, 12:15Laser processing of materials for advanced optoelectronic applicationsOral
Direct Laser Writing (DLW) is the basis of maskless photolithography for the fabrication of high-resolution diffractive optical elements (DOEs) and coded structures for long-term storage media. Traditional DOE design relies on analytical calculations, electromagnetic modeling, and iterative parameter optimization. For free-form geometries, the configuration space grows rapidly, which leads to...
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