7th Swiss-Sino Workshop

Name: 7th Swiss-Sino Workshop
Start: 2018-05-08T08:00:00+02:00
End: 2018-05-09T18:15:00+02:00
Location: Paul Scherrer Institute, meeting room WBGB/019

8–9 May 2018

Paul Scherrer Institute, meeting room WBGB/019

Europe/Zurich timezone

<span style="color: #f00"><strong>Registration deadline Wed 2 May 2018</strong></span>

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martina.fueglister@psi.ch

Molecular Glass Photoresists with High Resolution, Low LER and High Sensitivity for EUV Lithography

8 May 2018, 10:50

25m

WBGB/019 (Paul Scherrer Institute, meeting room WBGB/019)

WBGB/019

Paul Scherrer Institute, meeting room WBGB/019

Guoqiang Yang (Institute of Chemistry, CAS)

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7th Swiss-Sino Workshop

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